High-Precision 12-Station Automatic Spin Coater for Customizable Semiconductor & Perovskite Film Deposition

Подробная информация о продукте:

Место происхождения: Китай
Фирменное наименование: OSMANUV
Сертификация: ISO9001
Номер модели: Спецификация

Оплата и доставка Условия:

Количество мин заказа: 1 комплект
Цена: Возможен торг
Упаковывая детали: Деревянная упаковка
Время доставки: 30-45 дней
Условия оплаты: Т/Т
Поставка способности: Переговоры
Лучшая цена контакт

Подробная информация

Толщина покрытия: 180 г ~ 400 г Бренд инвертора: Шнайдер
Транспортировать направление: Слева направо. Влажность: 50±10°C
Точность регистрации: ± 0,15 мм отчет об испытаниях оборудования: Предоставил
Средняя скорость: 0 ~ 20 м/мин Максимальная ширина покрытия: 790*1150 мм
Выделить:

12-station automatic spin coater

,

semiconductor film deposition machine

,

perovskite spin coating equipment

Характер продукции

HIGH-PRECISION 12-STATION AUTOMATIC SPIN COATER FOR SEMICONDUCTOR & PEROVSKITE FILM PREPARATION
This 12-station spin coater is designed for high-throughput thin film deposition, supporting wafers, glass, and flexible substrates. Each station offers independent speed, acceleration, and coating time settings with closed-loop control achieving ±1 rpm accuracy. The number of stations, dispensing method, chamber size, and exhaust system are all customizable, making it ideal for both R&D and pilot production.
Technical Parameters
Parameter Value / Range Customization Option
Number of stations 12 Customizable: 4 / 8 / 12 / 16 stations
Speed range 100 - 10,000 rpm Extendable to 12,000 rpm
Acceleration range 50 - 10,000 rpm/s Customizable
Speed accuracy ±1 rpm -
Max substrate size 150 mm diameter Customizable up to 200 mm
Chamber material PP / PTFE / 316L stainless steel Customizable contact materials
Environmental control Exhaust & purge available Customizable N₂ purge module
Program storage 1000+ recipes -
Power supply AC 220V / 50Hz Customizable to 110V / 60Hz
Applications
  • Perovskite solar cell films
  • Photoresist coating (semiconductor lithography)
  • Sol-gel thin films
  • OLED & quantum dot emitting layers
  • Biosensor coatings
  • Customizable for non-planar or flexible substrates
Customization Options
We offer system-level and process-level customization:
  • Number of stations, layout, dispensing path
  • Chamber size and material (acid-resistant, solvent-resistant)
  • Automatic cleaning & waste solvent recovery system
  • Heating / UV / IR post-coating curing modules
  • Factory MES/ERP data interface integration
Key Features
  • 12 independently driven stations with separate motors & control
  • High acceleration response - reaches set speed in <0.5 seconds
  • Multi-point dispensing programming - supports dynamic/static dispensing
  • Cross-contamination prevention - independent exhaust channels per station
  • One-click recipe recall with optional barcode scanning startup
  • Customizable safety interlock & e-stop logic
Support and Services
  • Global remote support (TeamViewer/VPN)
  • On-site installation & training (optional)
  • Process consulting - viscosity/speed/thickness modeling
  • Local spare parts stock - customizable spare parts kit available
  • 18-month warranty (excluding intentional damage)
Packing and Shipping
  • Shockproof wooden case (ISTA standard compliant)
  • Desiccant & humidity indicator included inside
  • Shipping methods: sea / air / land - customizable export labeling & fumigation certificate available
  • Lead time: 4 weeks for standard models, 6-8 weeks for customized models
Frequently Asked Questions
Q1: Can it coat 8-inch wafers?
A: Standard max is 150 mm - chamber customizable up to 200 mm.
Q2: Can different stations run different recipes simultaneously?
A: Yes - each station is independently programmable.
Q3: Is N₂ environment coating supported?
A: Full-chamber N₂ purge with oxygen monitoring is customizable.

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